2018 г.

Dependence of Mechanical Stresses in Silicon Nitride Films on the Mode of Plasma-Enhanced Chemical Vapor Deposition

Автор(ы): Гусев Е.Э., Дедкова А.А., Новак А.В., Новак В.Р.
Опубликовано: Semiconductors. – 2018 Vol. 52, Is. 15. – P. 1953-1957
DOI: 10.1134/S1063782618150095
Статус: Scopus, Web of Science, ВАК, РИНЦ